Use of silicon or carbonitriding interface in the adhesion of Ag-DLC film on titanium alloy: a comparative study

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dc.contributor.authorOliveira A.
dc.contributor.authorda Silva Sobrinho A.S.
dc.contributor.authorLeite D.M.G.
dc.contributor.authorNeto J.J.
dc.contributor.authorGoncalves R.L.P.
dc.contributor.authorMassi M.
dc.date.accessioned2024-10-01T06:11:56Z
dc.date.available2024-10-01T06:11:56Z
dc.date.issued2024
dc.description.abstract© 2024, Escola de Minas. All rights reserved.A Hollow Cathode Plasma Enhanced Chemical Vapor Deposition (HC-PECVD) reactor was used to deposit silver doped Diamond-Like Carbon (Ag-DLC) films on Ti6Al4V alloy employing two methodologies: i) producing a silicon interlayer, using tetramethylsilane (TMS) as silicon precursor, varying the argon flow of the hollow cathode; and ii) carbonitriding the substrate. Profilometry, Raman, and Secondary Ion Mass Spectrometry (SIMS), as well as nanohardness, micro-scratch, scratch, and VDI 3198 indentation tests were used to evaluate the characteristics of the films and their adhesion on the substrates. The results demonstrated that the argon flow can be used for tuning the Ag-DLC film’s hardness, toughness, and adherence on silicon interlayers. The carbonitriding process, in turn, provided an improvement in the film toughness compared with non-carbonitrided samples. Considering the lower cost and easier handling of N2 compared to the silicon precursors commonly available (TMS, HDMSO, SiH4, etc.), the carbonitriding process proved more appropriate to improve the adhesion of the Ag-DLC films on the Ti6Al4V alloy.
dc.description.issuenumber4
dc.description.volume77
dc.identifier.doi10.1590/0370-44672024770004
dc.identifier.issnNone
dc.identifier.urihttps://dspace.mackenzie.br/handle/10899/39481
dc.relation.ispartofREM - International Engineering Journal.
dc.rightsAcesso Aberto
dc.subject.otherlanguagecarbonitriding
dc.subject.otherlanguagediamond-like carbon
dc.subject.otherlanguagehollow cathode
dc.subject.otherlanguagePECVD
dc.subject.otherlanguagescratch
dc.subject.otherlanguagetitanium
dc.titleUse of silicon or carbonitriding interface in the adhesion of Ag-DLC film on titanium alloy: a comparative study
dc.typeArtigo
local.scopus.citations0
local.scopus.eid2-s2.0-85204391768
local.scopus.updated2025-04-01
local.scopus.urlhttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85204391768&origin=inward
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