Thermal annealing effect on nitrogen-doped TiO2 thin films grown by high power impulse magnetron sputtering plasma power source

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dc.contributor.authorStegemann C.
dc.contributor.authorMoraes R.S.
dc.contributor.authorDuarte D.A.
dc.contributor.authorMassi M.
dc.date.accessioned2024-03-13T00:49:53Z
dc.date.available2024-03-13T00:49:53Z
dc.date.issued2017
dc.description.abstract© 2017The work reports plasma assisted growth of nitrogen-doped titanium dioxide (N-TiO2) thin films using high power impulse magnetron sputtering (HiPIMS) power source and effect of post-deposition thermal annealing. The films were deposited at low pressure. The binding energies of elements of interest, the energy gap, crystallinity and morphology of the films were analyzed before and after annealing. The results showed an increase in binding energies, a fact attributed to enhanced oxidation, after the annealing process. Only nitrogen doped samples grown by HiPIMS exhibited the presence of substitutional nitrogen. The energy gap of the films was found to decrease after doping and annealing. Improvement in crystallinity with a small shift in the crystalline peaks indicating decrease in lattice parameter, which could be seen by surface smoothing, was observed after thermal annealing. As a result of the growth of films by HiPIMS, nitrogen doping and post-deposition thermal annealing, improvements in the properties of the films which have relevance for photocatalytic and energy applications were observed.
dc.description.firstpage49
dc.description.lastpage55
dc.description.volume625
dc.identifier.doi10.1016/j.tsf.2017.01.043
dc.identifier.issn0040-6090
dc.identifier.urihttps://dspace.mackenzie.br/handle/10899/35786
dc.relation.ispartofThin Solid Films
dc.rightsAcesso Restrito
dc.subject.otherlanguageBinding energy
dc.subject.otherlanguageHigh power impulse magnetron sputtering
dc.subject.otherlanguageN-doped TiO2
dc.subject.otherlanguageSurface oxidation
dc.titleThermal annealing effect on nitrogen-doped TiO2 thin films grown by high power impulse magnetron sputtering plasma power source
dc.typeArtigo
local.scopus.citations15
local.scopus.eid2-s2.0-85012307852
local.scopus.subjectEnergy applications
local.scopus.subjectHigh power impulse magnetron sputtering (HIPIMS)
local.scopus.subjectN-doped TiO
local.scopus.subjectNitrogen-doped tio
local.scopus.subjectPlasma-assisted growth
local.scopus.subjectSubstitutional nitrogen
local.scopus.subjectSurface oxidations
local.scopus.subjectThermal annealing effects
local.scopus.updated2024-05-01
local.scopus.urlhttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85012307852&origin=inward
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