Characterization of the Nonlinear Susceptibility of Monolayer MoS2 using Second- and Third-Harmonic Generation Microscopy
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Artigo de evento
Date
2016
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Optics InfoBase Conference Papers
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0
Authors
Woodward R.I.
Murray R.T.
Phelan C.F.
de Oliveira R.E.P.
Li S.
Eda G.
de Matos C.J.S.
Murray R.T.
Phelan C.F.
de Oliveira R.E.P.
Li S.
Eda G.
de Matos C.J.S.
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Journal Title
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Abstract
© OSA 2016.Second- and third-harmonic generation microscopy of monolayer MoS2 is reported for imaging and characterization of the material's nonlinearity. A telecommunication wavelength pump is used, revealing the material's promise for use in nonlinear optical devices.
Description
Keywords
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Material non-linearity , Nonlinear optical devices , Nonlinear susceptibilities , Second and third harmonics , Telecommunication wavelengths , Third-harmonic generation microscopy