Characterization of the Nonlinear Susceptibility of Monolayer MoS2 using Second- and Third-Harmonic Generation Microscopy

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Artigo de evento
Date
2016
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Optics InfoBase Conference Papers
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0
Authors
Woodward R.I.
Murray R.T.
Phelan C.F.
de Oliveira R.E.P.
Li S.
Eda G.
de Matos C.J.S.
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Abstract
© OSA 2016.Second- and third-harmonic generation microscopy of monolayer MoS2 is reported for imaging and characterization of the material's nonlinearity. A telecommunication wavelength pump is used, revealing the material's promise for use in nonlinear optical devices.
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Keywords
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Material non-linearity , Nonlinear optical devices , Nonlinear susceptibilities , Second and third harmonics , Telecommunication wavelengths , Third-harmonic generation microscopy
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