Silicon-based film on the yttria-stabilized tetragonal zirconia polycrystal: Surface and shear bond strength analysis

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dc.contributor.authorSilva A.M.
dc.contributor.authorFigueiredo V.M.G.
dc.contributor.authorMassi M.
dc.contributor.authorPrado R.F.D.
dc.contributor.authorSilva Sobrinho A.S.D.
dc.contributor.authorQueiroz J.R.C.
dc.contributor.authorNogueira Junior L.
dc.date.accessioned2024-03-12T23:51:13Z
dc.date.available2024-03-12T23:51:13Z
dc.date.issued2019
dc.description.abstract© 2019 John Wiley & Sons Australia, Ltd.AIM: To analyze the effect of a silicon (Si)-based film deposited on yttria-stabilized tetragonal zirconia polycrystal (Y-TZP) on the topography and bond strength of resin cement. METHODS: Specimens of zirconia were obtained and randomly divided into 4 groups, according to surface treatment: polished group (PG) zirconia; sandblasted group (SG) zirconia with aluminum oxide (100 µm); after polished, zirconia was coated with Si-based film group (SiFG); and after sandblasted, zirconia was coated with Si-based film group (SiFSG). The Si-based films were obtained through plasma-enhanced chemical vapor deposition. Surface roughness and contact angle analysis were performed. Resin cement cylinders were built up on the treated surface of blocks, after applying Monobond-S. The specimens were submitted to thermocycling aging and shear bond strength testing. The Kruskal-Wallis and Mann-Whitney U-tests were performed. RESULTS: There were significant differences between the surface treatments for each roughness parameter measured. Si-based film increased roughness and decreased the contact angle. Si-based film groups also demonstrated significantly lower bond strength values. CONCLUSION: Si-based film produced using plasma deposition provided lower bond strength to resin cement compared with conventional treatment; however, the film deposition reduced the contact angle and improved roughness, favorable properties in the long way to prepare an optimum material.
dc.description.firstpagee12477
dc.description.issuenumber4
dc.description.volume10
dc.identifier.doi10.1111/jicd.12477
dc.identifier.issn2041-1626
dc.identifier.urihttps://dspace.mackenzie.br/handle/10899/35163
dc.relation.ispartofJournal of investigative and clinical dentistry
dc.rightsAcesso Restrito
dc.subject.otherlanguageadhesion
dc.subject.otherlanguageplasma-enhanced chemical vapor deposition
dc.subject.otherlanguageroughness
dc.subject.otherlanguageshear bond strength
dc.subject.otherlanguagezirconia
dc.titleSilicon-based film on the yttria-stabilized tetragonal zirconia polycrystal: Surface and shear bond strength analysis
dc.typeArtigo
local.scopus.citations5
local.scopus.eid2-s2.0-85075813598
local.scopus.subjectDental Bonding
local.scopus.subjectDental Stress Analysis
local.scopus.subjectMaterials Testing
local.scopus.subjectMicroscopy, Electron, Scanning
local.scopus.subjectResin Cements
local.scopus.subjectShear Strength
local.scopus.subjectSilicon
local.scopus.subjectSurface Properties
local.scopus.subjectYttrium
local.scopus.subjectZirconium
local.scopus.updated2024-05-01
local.scopus.urlhttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85075813598&origin=inward
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