Characterization of the nonlinear susceptibility of monolayer MoS2 using second- and third-harmonic generation microscopy

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dc.contributor.authorWoodward R.I.
dc.contributor.authorMurray R.T.
dc.contributor.authorPhelan C.F.
dc.contributor.authorDe Oliveira R.E.P.
dc.contributor.authorLi S.
dc.contributor.authorEda G.
dc.contributor.authorDe Matos C.J.S.
dc.date.accessioned2024-03-13T00:51:41Z
dc.date.available2024-03-13T00:51:41Z
dc.date.issued2016
dc.description.abstract© 2016 OSA.Second- and third-harmonic generation microscopy of monolayer MoS2 is reported for imaging and characterization of the material's nonlinearity. A telecommunication wavelength pump is used, revealing the material's promise for use in nonlinear optical devices.
dc.identifier.doi10.1364/cleo_si.2016.stu1r.3
dc.identifier.urihttps://dspace.mackenzie.br/handle/10899/35889
dc.relation.ispartof2016 Conference on Lasers and Electro-Optics, CLEO 2016
dc.rightsAcesso Restrito
dc.titleCharacterization of the nonlinear susceptibility of monolayer MoS2 using second- and third-harmonic generation microscopy
dc.typeArtigo de evento
local.scopus.citations2
local.scopus.eid2-s2.0-85010637711
local.scopus.subjectNonlinear optical devices
local.scopus.subjectNonlinear susceptibilities
local.scopus.subjectSecond and third harmonics
local.scopus.subjectTelecommunication wavelengths
local.scopus.updated2024-05-01
local.scopus.urlhttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85010637711&origin=inward
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