Cracking failure analysis due to fatigue of the Ti-6Al-4V alloy coated with SiC layer and Cr interlayer deposited by magnetron sputtering

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dc.contributor.authorArbex A.A.
dc.contributor.authorReis L.
dc.contributor.authorAlmeida G.F.C.
dc.contributor.authorMerij A.C.
dc.contributor.authorMassi M.
dc.contributor.authorCouto A.A.
dc.date.accessioned2024-03-12T19:09:03Z
dc.date.available2024-03-12T19:09:03Z
dc.date.issued2023
dc.description.abstract© 2023 Elsevier LtdThis work aimed to study the effects of coating a thin film of Silicon Carbide and chromium interlayer on the fatigue behavior of Ti-6Al-4V alloy and the correspondent failure evaluation. In the characterization of the layer, the roughness, thickness, and adhesion were determined. Uniaxial fatigue tests were performed under R = 0.1 and the fracture surfaces and corresponding failure mechanisms were observed and identified by SEM, respectively. In the specimens coated using the DC source the number of cycles to failure of the fatigue was increased. The fracture surfaces showed that the crack initiation occurred in the internal regions of the specimens and not superficially. In this case, the layer remained adhered to the specimens even after the tests, showing the effectiveness of the film. In specimens coated using the HiPIMS source, the number of cycles to failure decreased, the cracks were mostly superficial, and the deposited film showed low adhesion after the tests. It proved to be ineffective, worsening the material fatigue behavior.
dc.description.volume150
dc.identifier.doi10.1016/j.engfailanal.2023.107325
dc.identifier.issn1350-6307
dc.identifier.urihttps://dspace.mackenzie.br/handle/10899/34048
dc.relation.ispartofEngineering Failure Analysis
dc.rightsAcesso Restrito
dc.subject.otherlanguageFatigue
dc.subject.otherlanguageFractography
dc.subject.otherlanguageHIPIMS
dc.subject.otherlanguageThin films
dc.subject.otherlanguageTi-6Al-4V
dc.titleCracking failure analysis due to fatigue of the Ti-6Al-4V alloy coated with SiC layer and Cr interlayer deposited by magnetron sputtering
dc.typeArtigo
local.scopus.citations1
local.scopus.eid2-s2.0-85159638856
local.scopus.subjectDC sources
local.scopus.subjectFailure mechanism
local.scopus.subjectFatigue behaviour
local.scopus.subjectFracture surfaces
local.scopus.subjectHIPIMS
local.scopus.subjectMagnetron-sputtering
local.scopus.subjectNumber of cycles to failure
local.scopus.subjectThin-films
local.scopus.subjectTi-6al-4v
local.scopus.subjectUniaxial fatigue
local.scopus.updated2024-10-01
local.scopus.urlhttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85159638856&origin=inward
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