Definition of CVD Graphene Micro Ribbons with Lithography and Oxygen Plasma Ashing

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dc.contributor.authorRufino F.C.
dc.contributor.authorPascon A.M.
dc.contributor.authorEspindola L.C.J.
dc.contributor.authorCioldin F.H.
dc.contributor.authorLarrude D.R.G.
dc.contributor.authorDiniz J.A.
dc.date.accessioned2024-03-12T19:19:52Z
dc.date.available2024-03-12T19:19:52Z
dc.date.issued2021
dc.description.abstract© 2021This work presents the definition of CVD (Chemical Vapor Deposition) Graphene Micro Ribbons (GMRs) with traditional Photolithography and Oxygen Plasma Ashing, where: (i) CVD Graphene Micro Ribbons were defined in parallel and serpentine patterns; (ii) The defined width dimensions of GMRs are between 0.23 µm and 10 µm; (iii) The empirical calibration curve between physical and mask widths of GMRs was obtained; (iv) With our method, Graphene Field-Effect Transistors, GFETs, can be fabricated with parallel GMRs as conduction channel between source and drain. It is important to notice that parallel channels are used in Silicon Nano Wires 3D Transistors, such as FinFETs. Our method is based on low-cost lithography, compared to commonly found in the literature, based on the definition of graphene patterns by Electron Beam Lithography (high cost and low repeatability techniques). Also, graphene's good quality characteristics remain after GMRs fabrication, as proven by Raman spectroscopy. In conclusion, our method to define the GMRs is suitable for GFET technology.
dc.description.volume4
dc.identifier.doi10.1016/j.cartre.2021.100056
dc.identifier.issn2667-0569
dc.identifier.urihttps://dspace.mackenzie.br/handle/10899/34625
dc.relation.ispartofCarbon Trends
dc.rightsAcesso Aberto
dc.subject.otherlanguageGFET technology
dc.subject.otherlanguageGraphene
dc.subject.otherlanguageOxygen Plasma Ashing
dc.subject.otherlanguagePhotolithography
dc.titleDefinition of CVD Graphene Micro Ribbons with Lithography and Oxygen Plasma Ashing
dc.typeArtigo
local.scopus.citations6
local.scopus.eid2-s2.0-85118346761
local.scopus.subjectCalibration curves
local.scopus.subjectChemical vapor deposition graphene
local.scopus.subjectConduction channel
local.scopus.subjectEmpirical calibration
local.scopus.subjectGFET technology
local.scopus.subjectGraphene field-effect transistors
local.scopus.subjectNano-wires
local.scopus.subjectOxygen plasma ashing
local.scopus.subjectParallel channel
local.scopus.subjectSource and drains
local.scopus.updated2024-12-01
local.scopus.urlhttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85118346761&origin=inward
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