The Role of HiPIMS Pulse Length in Reactive Deposition of Transparent Conductive Oxide Nb:TiO2 Films

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dc.contributor.authorStryhalski J.
dc.contributor.authorLaur A.
dc.contributor.authorSagas J.C.
dc.contributor.authoroA.A Cout
dc.contributor.authorGrigorov K.
dc.contributor.authorFontana L.C.
dc.contributor.authorMassi M.
dc.date.accessioned2024-03-12T19:11:49Z
dc.date.available2024-03-12T19:11:49Z
dc.date.issued2023
dc.description.abstract© 2023 Universidade Federal de Sao Carlos. All rights reserved.The present paper sets out to investigate the role of voltage pulse length on the properties of Nb:TiO2 films deposited by High Power Impulse Magnetron Sputtering (HiPIMS). Several characteristics of the films were investigated, namely, resistivity, transmittance, crystallinity and band gap values of Nb:TiO2 films. Reactive depositions were carried out in Ar/O2 plasma with 40 μs, 50 μs, 60 μs, and 70 μs pulses. Increasing the pulse length changes the deposition from compound to metal mode. As it gets closer to metal mode, the deposition rate increases by up to one order of magnitude, while the resistivity of the resulting Nb:TiO2 film becomes as low as 10-4 Ω.cm, without any significant loss in optical transmittance, which remains close to 90% for a wavelength around 450 nm, but reduction in 25% of heat transmission (above 800 nm) were observed. Results indicate the anatase phase for all deposition conditions, and Ti3+ states increase with the pulse length, which can be explained by the generation of a second band gap. Both the niobium doping and the Ti3+ states can contribute to increase the conductivity of the Nb:TiO2 films in the as-deposited condition.
dc.description.volume26
dc.identifier.doi10.1590/1980-5373-MR-2022-0498
dc.identifier.issn1980-5373
dc.identifier.urihttps://dspace.mackenzie.br/handle/10899/34195
dc.relation.ispartofMaterials Research
dc.rightsAcesso Aberto
dc.subject.otherlanguageHiPIMS
dc.subject.otherlanguageNiobium
dc.subject.otherlanguageOptical properties
dc.subject.otherlanguageResistivity
dc.subject.otherlanguageTitanium dioxide
dc.titleThe Role of HiPIMS Pulse Length in Reactive Deposition of Transparent Conductive Oxide Nb:TiO2 Films
dc.typeArtigo
local.scopus.citations0
local.scopus.eid2-s2.0-85166389557
local.scopus.subjectHigh power
local.scopus.subjectHigh power impulse magnetra sputtering
local.scopus.subjectMagnetron-sputtering
local.scopus.subjectProperty
local.scopus.subjectPulse length
local.scopus.subjectReactive deposition
local.scopus.subjectResistivity
local.scopus.subjectTiO2 film
local.scopus.subjectTransparent conductive oxides
local.scopus.subjectVoltage pulse
local.scopus.updated2024-10-01
local.scopus.urlhttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85166389557&origin=inward
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