Analysis of the Surface Treatments Effect on the Creep Behavior of Ti-6Al-4V Alloy

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dc.contributor.authorAlmeida G.F.C.
dc.contributor.authorSugahara T.
dc.contributor.authorArbex A.A.
dc.contributor.authorCouto A.A.
dc.contributor.authorMassi M.
dc.contributor.authorMontoro F.E.
dc.contributor.authorReis D.A.P.
dc.date.accessioned2024-03-12T23:49:23Z
dc.date.available2024-03-12T23:49:23Z
dc.date.issued2020
dc.description.abstract© 2020 Universidade Federal de Sao Carlos. All rights reserved.This paper compares the creep behavior of Ti-6Al-4V alloy after different surface treatments, the plasma nitriding using Plasma Enhanced Chemical Vapor Deposition (PECVD), and the deposition of SiC thin films with Cr interlayer using High Power Impulse Magnetron Sputtering (HiPIMS). A microstructural characterization was performed with Scanning Electron Microscopy (SEM), Scanning and Transmission Electron Microscopy (STEM), and Energy Dispersive Spectroscopy (EDS) techniques. The creep test was performed at a constant load from 500 to 600 °C and 125 to 319 MPa, and a fractographic analysis was performed. The EDS analysis of the plasma nitrided layer indicated the nitrogen presence of the compounds TiN and Ti2N and an increase in the iron concentration. Creep test results in both conditions indicated an increase in the creep resistance. Plasma nitrided condition indicated the lowest creep rate and lesser elongation, making it the most suitable in applications that require a low dimensional distortion.
dc.description.issuenumber6
dc.description.volume23
dc.identifier.doi10.1590/1980-5373-MR-2020-0314
dc.identifier.issn1980-5373
dc.identifier.urihttps://dspace.mackenzie.br/handle/10899/35060
dc.relation.ispartofMaterials Research
dc.rightsAcesso Aberto
dc.subject.otherlanguageCreep
dc.subject.otherlanguageHiPIMS
dc.subject.otherlanguagePlasma nitriding
dc.subject.otherlanguageSiC film
dc.subject.otherlanguageTi-6Al-4V
dc.titleAnalysis of the Surface Treatments Effect on the Creep Behavior of Ti-6Al-4V Alloy
dc.typeArtigo
local.scopus.citations2
local.scopus.eid2-s2.0-85097348564
local.scopus.subjectEnergy dispersive spectroscopies (EDS)
local.scopus.subjectFractographic analysis
local.scopus.subjectHigh power impulse magnetron sputtering (HIPIMS)
local.scopus.subjectIron concentrations
local.scopus.subjectMicro-structural characterization
local.scopus.subjectPlasma enhanced chemical vapor depositions (PE CVD)
local.scopus.subjectPlasma-nitrided layers
local.scopus.subjectScanning and transmission electron microscopy
local.scopus.updated2024-05-01
local.scopus.urlhttps://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85097348564&origin=inward
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