Deposição de filmes de nitreto de boro para redução do atrito em componente de armas
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Tipo
TCC
Data de publicação
2021-12
Periódico
Citações (Scopus)
Autores
Cavalheiro, Brian Wenzel
Adams, Johnny Laires
Adams, Johnny Laires
Orientador
Oliveira, Carlos Alberto Monezi de
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Nesse artigo realizamos um estudo sobre deposição de Nitreto de Boro hexagonal por tecnologia de plasma e apresentamos os resultados obtidos das deposições realizadas no laboratório. Filmes finos de nitreto de boro foram depositados pelo método de deposição física de vapor sobre substratos de aço 4140 e silício com o objetivo de reduzir atritos e aumentar a resistência superficial para evitar falhas em componente de armas. Foram realizadas duas deposições alterando a potência da fonte RF, a primeira com 226W de potência e pressão de gás na câmara de vácuo de 8,0𝑥��10−3 𝑇��𝑜��𝑟��𝑟��. Para a segunda deposição a potência da fonte RF foi alterada para 135W e a pressão de gás na câmara de vácuo aumentou para 9,7𝑥��10−3 𝑇��𝑜��𝑟��𝑟��. A temperatura dos substratos variou de 32°C a 44°C. A razão de gases utilizada para ambas as deposições foi 75% de argônio e 25% de nitrogênio. O tempo para deposições foi de 60 minutos. Após as deposições foram feitos estudos da superfície como difratômetro de raio X, ensaio de tribologia e microscopia de força atômica, para identificar as novas propriedades metalográficas da superfície e se houve a deposição do nitreto de boro em sua forma hexagonal. Obtivemos um resultado satisfatório nas deposições e no ensaio de tribologia. No microscópio de força atômica não foi possível determinar a espessura do filme depositado. De forma geral, a deposição de hBN teve êxito ao reduzir o coeficiente de atrito e aumentar a resistência superficial.
In this article, it was investigated about the deposition of thin hexagonal boron nitride films by plasma technology. It presents all results obtained in the laboratory. Boron nitride thin films were deposited on 4140 steel and silicon substrates. The intention of the study is to increase wear resistance and decrease the friction coefficient in order to prevent failures in weapon components. Two different power sources were used at temperatures that ranged from 32°C to 44°C. The gas ratio used was 75% argon and 25% nitrogen. In the first deposition 226W of power was used in the RF source and the gas pressure in the vacuum chamber was kept at 8,0𝑥�10−3 𝑇�𝑜�𝑟�𝑟�. In the second deposition the power changed from 226W to 135W and the gas pressure kept at 9,7𝑥�10−3 𝑇�𝑜�𝑟�𝑟�. The deposition time took 60 minutes to be concluded. In order to identify the new properties from the deposition thin layer, the X-ray diffractometer, tribology test and AFM tests were performed on the samples. It obtained satisfactory results in the depositions and tribology tests. In the AFM test it was not possible to measure the thin layer of film. In a general way the deposition of hBN was a success in reducing friction coefficient and increasing wear resistance.
In this article, it was investigated about the deposition of thin hexagonal boron nitride films by plasma technology. It presents all results obtained in the laboratory. Boron nitride thin films were deposited on 4140 steel and silicon substrates. The intention of the study is to increase wear resistance and decrease the friction coefficient in order to prevent failures in weapon components. Two different power sources were used at temperatures that ranged from 32°C to 44°C. The gas ratio used was 75% argon and 25% nitrogen. In the first deposition 226W of power was used in the RF source and the gas pressure in the vacuum chamber was kept at 8,0𝑥�10−3 𝑇�𝑜�𝑟�𝑟�. In the second deposition the power changed from 226W to 135W and the gas pressure kept at 9,7𝑥�10−3 𝑇�𝑜�𝑟�𝑟�. The deposition time took 60 minutes to be concluded. In order to identify the new properties from the deposition thin layer, the X-ray diffractometer, tribology test and AFM tests were performed on the samples. It obtained satisfactory results in the depositions and tribology tests. In the AFM test it was not possible to measure the thin layer of film. In a general way the deposition of hBN was a success in reducing friction coefficient and increasing wear resistance.
Descrição
Palavras-chave
nitreto de boro hexagonal , redução de atrito , deposição física de vapor , hexagonal boron nitride , friction reduction. , physical vapor deposition